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This lab is devoted to the structural characterization and processing of materials at the micro-nanometer scale, performed with a versatile Dual Beam Focused Ion Beam (FIB) – Field Emission Scanning Electron Microscope (FESEM), a ZEISS AURIGA. With this tool it is possible to investigate the topography of the materials, to map the composition by EDS (also in 3D by combining milling with FIB), to write patterns with either e-beam or ion beam, to prepare lamellae for TEM, to create micro or nano-electrical contacts for electrical characterizations.


Techniques available:

FESEM, FIB, e-beam lithography, i-beam lithography, EDS




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